Prosecution Argument Bars Later Recapture Through Broadening Reissue
| August 29, 2012
Greenliant Systems, Inc. v. Xicor LLC
August 22, 2012
Panel: Linn, Plager and Dyk. Opinion by Dyk
Summary:
Xicor obtained a patent claiming a semiconductor device with a tunneling layer formed by low pressure chemical vapor (CVD) deposition using tetraethylorthosilicate (TEOS). Xicor sought and obtained reissue of the patent with device claims that did not recite the use of TEOS. Subsequently, Greenliant sued Xicor for declaratory judgment of invalidity of the reissue claims based on recapture rule, which prohibits recapture via reissue of subject matter surrendered in order to overcome prior art during prosecution of the original patent. The District Court held the reissue claims invalid, and the Federal Circuit affirms. Xicor had repeatedly argued during prosecution of the original patent that the product-by-process limitation of using TEOS imparted structural limitations to the final product. This is sufficient for the recapture rule to apply, even if Xicor now recognizes that the structure of the tunneling layer does not actually depend on the material used for the CVD process, but on deposition conditions such as temperature and pressure.
Tags: broadening reissue > estoppel > prosecution argument > prosecution history estoppel > recapture > reissue > Reissue Claim
Recapture Issues in a Reissue Application
| May 30, 2012
In Re Roger Youman and Marney Morris
May 8, 2012
Panel: Lourie, Schall and Prost. Opinion by Prost. Dissent by Lourie.
Summary:
Applicants filed a broadening reissue application within two years of the patent issuing. The examiner rejected the claims because applicants attempted to recapture surrendered subject matter. The Board of Patent Appeals and Interferences (BPAI) affirmed the examiner’s rejection but the Court of Appeals for the Federal Circuit (CAFC) overturned the BPAI ruling and in doing so, clarified the three step process to determine if applicant is barred by the recapture rule.
Tags: §251 > Broadening > broadening reissue > Error Without Deceptive Intent > Intentional Surrender > Narrowing > recapture > reissue > Reissue Claim
Interpretation of statutory two-year time limit for enlarging the scope of claim in a continuing reissue application filed after the two-year window
| March 14, 2012
In re Erik P. Staats and Robin D. Lash
March 5, 2012
Panel: Dyk, O’Malley and Reyna. Opinion by Dyk. Concurrence by O’Malley.
Summary:
In 1999, a patent was issued to Staats (assigned to Apple Computer) based on an application for his invention regarding isochronous data transfer in a computer. The patent discloses two embodiments. Staats then filed a first reissue application within two years from the issue date of the patent, broadening the scope of claims related to a first embodiment. Outside the two-year window, he further filed other broadening reissue applications as continuations. In 2007, almost seven years after the original patent issued, the last broadening reissue application was filed, which is related to a second embodiment. The PTO’s board held that the last continuing reissue application was not filed within the two-year window because it was not related to the first embodiment which was timely presented within the two-year window. The CAFC reversed and remanded this case, affirming their precedent case which holds that the statutory two-year limit applies to only the filing date of a reissue application, not to the date that broadened claims are presented.
出願人は、コンピュータのデータトランスファーに関する発明を出願し、特許を取得した。その後、クレーム範囲を広げる再発行特許出願を行った。特許出願の明細書には、発明の2つの態様が開示されていた。最初の再発行特許は第1の態様に関するものであり、審査の結果、再発行特許として発行された。その第1の再発行特許が許可される前に出願人は、継続出願として、第2の再発行出願を行い、さらに第2の再発行出願が許可される前に、第3の再発行出願を行った。この第3の再発行出願には、最初の出願もしくは第1の再発行出願でクレームされていた第1の態様とは異なる第2の態様がクレームされていた。特許庁は、第3の再発行出願は最初の再発行出願とは関係のない発明のクレーム範囲を拡大しようとするものであるから、クレーム範囲の拡大は最初の特許発行日から2年以内にのみ可能であるという米国特許法251条の規定に違反するとして拒絶し、審判部もその拒絶を維持した。CAFCは、審判部の判断は誤りであり、クレームを拡大するための最初の再発行出願が2年以内に行われていたか否かが問題であり、その後の継続再発行出願のクレーム内容が最初の再発行出願のクレーム内容と関係があるか否かは問題ではないと判断した。
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Tags: broadening reissue > reissue > two-year window
